edwards News & Events(2)

To manage these challenging conditions, the iXH features improved thermal control and increased torque. It is also ideal for extreme powder processes with TEOS flows above 5 g/min, featuring larger exhaust stages and the innovative Gas Buster™ inlet purge to deal with the process byproducts and minimize system maintenance.Other advanced processes, such as gallium nitride compound semiconductor production, require large flows of hydrogen and ammonia. Because of the small size of the hydrogen molecule it is difficult to pump, while ammonia is highly corrosive.

The iXH pump mechanism has been optimized to handle hydrogen and to better with stand the corrosive effects of ammonia by using patented technology.The improved powder handling and corrosion resistance of the new iXH pump also helps to reduce pump CoO by extending the maintenance interval. At the same time, the pump’s Active Utility Control (AUC), which includes an idle mode for periods when the pump is not in use, can reduce utility costs by more than 10 percent compared to the previous generation of Edwards harsh process pumps.

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